Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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==The Bosch process in the DRIE-Pegasus== | ==The Bosch process in the DRIE-Pegasus== | ||
[[Specific_Process_Knowledge/Etch/DRIE-Pegasus/System-description|Specific_Process_Knowledge/Etch/DRIE-Pegasus/System-description]] | |||
The DRIE-Pegasus takes the well established Bosch process known from the [[Specific_Process_Knowledge/Etch/ASE_(Advanced_Silicon_Etch)|ASE]] a significant step further. In the ASE the Bosch process has two cycles, etch and passivation. During each cycle the process parameters are kept constant (This is, at least, that is the intention - the reality is that the ideal square function is rarely achieved during process parameter changes). | The DRIE-Pegasus takes the well established Bosch process known from the [[Specific_Process_Knowledge/Etch/ASE_(Advanced_Silicon_Etch)|ASE]] a significant step further. In the ASE the Bosch process has two cycles, etch and passivation. During each cycle the process parameters are kept constant (This is, at least, that is the intention - the reality is that the ideal square function is rarely achieved during process parameter changes). | ||