Jump to content

Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS: Difference between revisions

← Older editNewer edit →
VisualWikitext
Line 56: Line 56:
|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1-25 4" wafer per run
*1-15 4" wafers per run
*Deposition on both sides of the substrate
*Deposition on both sides of the substrate
|-
|-
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_TEOS"