Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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'''SEM images from different exposure equipment:''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
! | |||
!2µm triplets | |||
!Lines | |||
!Trenches | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Aligner: MA6-2 | |||
220mJ/cm<sup>2</sup>, vacuum contact | |||
|[[Image:W18 MA62 MiR vac D220_I3T_03.jpg|400px]] | |||
|[[Image:W18 MA62 MiR vac D220_I3T_02.jpg|400px]] | |||
|[[Image:W18 MA62 MiR vac D220_I3T_01.jpg|400px]] | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Aligner: Maskless 02 (MLA2) | |||
275mJ/cm<sup>2</sup>, defoc 2 | |||
|[[Image:W15 MLA2 MiR F2 D275_03.jpg|400px]] | |||
|[[Image:W15 MLA2 MiR F2 D275_02.jpg|400px]] | |||
|[[Image:W15 MLA2 MiR F2 D275_01.jpg|400px]] | |||
|} | |} | ||
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