Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
| Line 19: | Line 19: | ||
==AZ 5214E== | ==AZ 5214E== | ||
===Resolution=== | ===Resolution=== | ||
'''Resolution at optimal conditions for different exposure equipment:''' | '''Resolution at optimal processing conditions for different exposure equipment:''' | ||
{| class="wikitable" | {| class="wikitable" | ||
|+ | |+ | ||
| Line 113: | Line 113: | ||
===Yield=== | ===Yield=== | ||
The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines. | The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines. | ||
<br clear="all" /> | <br clear="all" /> | ||
| Line 188: | Line 189: | ||
===Resist profile=== | ===Resist profile=== | ||
====Linewidth and sidewall angle vs exposure dose==== | ====Linewidth and sidewall angle vs exposure dose==== | ||
'''SEM images of 2µm triplets as a function of exposure dose:''' | '''SEM images of 2µm triplets as a function of exposure dose:''' | ||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | ||
| Line 214: | Line 217: | ||
|} | |} | ||
<br clear="all" /> | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | ||
| Line 238: | Line 241: | ||
|} | |} | ||
<br clear="all" /> | |||
'''Result of image analysis of SEM images of 2µm triplets:''' | '''Result of image analysis of SEM images of 2µm triplets:''' | ||
| Line 245: | Line 248: | ||
! width="510" | | ! width="510" | | ||
|+ | |+ | ||
|- border="0" align="center" | |- border="0" align="center" | ||
|[[Image:5214E_Linewidth vs dose.jpg|500px]] | |[[Image:5214E_Linewidth vs dose.jpg|500px]] | ||
| Line 251: | Line 254: | ||
|- align="center" | |- align="center" | ||
| colspan="2" | Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). | | colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). | ||
|} | |} | ||
<br clear="all" /> | <br clear="all" /> | ||
====Linewidth and sidewall angle vs defocus parameter==== | |||
'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:''' | '''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:''' | ||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | ||
| Line 290: | Line 293: | ||
|} | |} | ||
<br clear="all" /> | |||
'''Result of image analysis of SEM images of 2µm triplets:''' | '''Result of image analysis of SEM images of 2µm triplets:''' | ||
| Line 296: | Line 299: | ||
! width="510" | | ! width="510" | | ||
|+ | |+ | ||
|- border="0" align="center" | |- border="0" align="center" | ||
|[[Image:5214E_Profile vs defoc.jpg|500px]] | |[[Image:5214E_Profile vs defoc.jpg|500px]] | ||
|- align="center" | |- align="center" | ||
| Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle. | | Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle. | ||
|} | |} | ||