Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
| Line 41: | Line 41: | ||
100mJ/cm<sup>2</sup>, vacuum contact | 100mJ/cm<sup>2</sup>, vacuum contact | ||
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|[[W14 MA62 5214E vac D100_B4T_01.jpg|350px]] | |[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|350px]] | ||
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|[[W14 MA62 5214E vac D100_B4T_02.jpg|350px]] | |[[Image:W14 MA62 5214E vac D100_B4T_02.jpg|350px]] | ||
|[[W14 MA62 5214E vac D100_B4T_03.jpg|350px]] | |[[Image:W14 MA62 5214E vac D100_B4T_03.jpg|350px]] | ||
|- | |- | ||
| Line 51: | Line 51: | ||
100mJ/cm<sup>2</sup>, vacuum contact | 100mJ/cm<sup>2</sup>, vacuum contact | ||
(probably over-exposed) | (probably over-exposed) | ||
|[[W32 PFL 5214 D100 vac C6B_02.jpg|350px]] | |[[Image:W32 PFL 5214 D100 vac C6B_02.jpg|350px]] | ||
|[[W32 PFL 5214 D100 vac C6B_01.jpg|350px]] | |[[Image:W32 PFL 5214 D100 vac C6B_01.jpg|350px]] | ||
|[[W32 PFL 5214 D100 vac C6B_03.jpg|350px]] | |[[Image:W32 PFL 5214 D100 vac C6B_03.jpg|350px]] | ||
|[[W32 PFL 5214 D100 vac C6B_04.jpg|350px]] | |[[Image:W32 PFL 5214 D100 vac C6B_04.jpg|350px]] | ||
|[[W32 PFL 5214 D100 vac C6B_05.jpg|350px]] | |[[Image:W32 PFL 5214 D100 vac C6B_05.jpg|350px]] | ||
|- | |- | ||
| Line 62: | Line 62: | ||
90mJ/cm<sup>2</sup>, defoc 2 | 90mJ/cm<sup>2</sup>, defoc 2 | ||
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|[[W13 mla2 5214E D90 F2_05.jpg|350px]] | |[[Image:W13 mla2 5214E D90 F2_05.jpg|350px]] | ||
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|[[W13 mla2 5214E D90 F2_01.jpg|350px]] | |[[Image:W13 mla2 5214E D90 F2_01.jpg|350px]] | ||
|[[W13 mla2 5214E D90 F2_02.jpg|350px]] | |[[Image:W13 mla2 5214E D90 F2_02.jpg|350px]] | ||
|} | |} | ||