Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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==AZ 5214E== | ==AZ 5214E== | ||
===Resolution | ===Resolution=== | ||
* Table with optimal parameters and resolution for different aligners | * Table with optimal parameters and resolution for different aligners | ||
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===Yield=== | |||
* Wafer maps of: | * Wafer maps of: | ||
** Aligner: Maskless 02 (MLA2) | ** Aligner: Maskless 02 (MLA2) | ||
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** Aligner: MA6-2 before service | ** Aligner: MA6-2 before service | ||
** Aligner: MA6-2 after service + WEC pressure | ** Aligner: MA6-2 after service + WEC pressure | ||
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===Resist profile (sidewall angle and linewidth)=== | ===Resist profile (sidewall angle and linewidth)=== | ||