Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
| Line 22: | Line 22: | ||
===Resist profile (sidewall angle and linewidth)=== | ===Resist profile (sidewall angle and linewidth)=== | ||
[[Image:5214E_Linewidth vs dose.jpg|left|600px|thumb|Width of 2µm line vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]] | |||
[[Image:5214E_Sidewall vs dose.jpg|left|600px|thumb|Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]] | |||
<!-- | |||
{| cellpadding="2" style="border: 2px solid darkgray;" align="center" | {| cellpadding="2" style="border: 2px solid darkgray;" align="center" | ||
! width="350" | | ! width="350" | | ||
| Line 36: | Line 39: | ||
|} | |} | ||
--> | |||
<br clear="all" /> | |||
==AZ MiR 701== | ==AZ MiR 701== | ||
Revision as of 15:46, 8 June 2026
The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.
Feedback to this page: click here
Slides presented at NNUM in Uppsala 2026
Additional data
THIS PAGE IS UNDER CONSTRUCTION
AZ 5214E
Resolution and yield
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2
- Aligner: MA6-1
Resist profile (sidewall angle and linewidth)
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
AZ MiR 701
Resolution
Resist profile (sidewall angle and linewidth)
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2
AZ nLOF 2020
Resolution
Resist profile (sidewall angle and linewidth)
- Aligner: Maskless 01 (MLA1)
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2