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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,602 edits
Line 20: Line 20:
* Aligner: MA6-2
* Aligner: MA6-2
* Aligner: MA6-1
* Aligner: MA6-1
===Sidewall angle===
===Resist profile (sidewall angle and linewidth)===
* Aligner: Maskless 02 (MLA2)
* Aligner: MA6-2
* Aligner: MA6-1
===Linewidth / Bias===
* Aligner: Maskless 02 (MLA2)
* Aligner: Maskless 02 (MLA2)
* Aligner: MA6-2
* Aligner: MA6-2
Line 31: Line 27:
==AZ MiR 701==
==AZ MiR 701==
===Resolution===
===Resolution===
===Sidewall angle===
===Resist profile (sidewall angle and linewidth)===
* Aligner: Maskless 02 (MLA2)
* Aligner: MA6-2
===Linewidth / Bias===
* Aligner: Maskless 02 (MLA2)
* Aligner: Maskless 02 (MLA2)
* Aligner: MA6-2
* Aligner: MA6-2
Line 40: Line 33:
==AZ nLOF 2020==
==AZ nLOF 2020==
===Resolution===
===Resolution===
===Sidewall angle===
===Resist profile (sidewall angle and linewidth)===
* Aligner: Maskless 01 (MLA1)
* Aligner: Maskless 02 (MLA2)
* Aligner: MA6-2
===Linewidth / Bias===
* Aligner: Maskless 01 (MLA1)
* Aligner: Maskless 01 (MLA1)
* Aligner: Maskless 02 (MLA2)
* Aligner: Maskless 02 (MLA2)
* Aligner: MA6-2
* Aligner: MA6-2
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