Specific Process Knowledge/Lithography/MiR: Difference between revisions
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==Exposure== | ==Exposure== | ||
'''Dehydration of resist film:'''<br> | '''Dehydration of resist film:'''<br> | ||
During exposure in the maskless aligners, MiR can be sensitive to dehydration by the air flow applied by the pneumatic auto-focus mechanism. This may lead to insufficient development, especially for small substrates. This problem can be alleviated by switching to the overview camera for a period of 1 minute before starting the exposure, or simply by parking the writehead away from the exposure location for 1 minute before starting the exposure. | During exposure in the maskless aligners, MiR can be sensitive to dehydration by the air flow applied by the pneumatic auto-focus mechanism. This may lead to insufficient development, especially for small substrates. This problem can be alleviated by switching to the overview camera for a period of 1 minute before starting the exposure, or simply by parking the writehead away from the exposure location for 1 minute before starting the exposure. Dehydration can also mess up a dose test, but this can be fixed by increasing the spacing between the individual doses, or even better by extending the test design to 40mm or more in the Y-direction (adding a very small structure in the design file, or increasing the upper boarder during conversion). | ||
The effect can also be reduced by increasing the soft bake. | The effect can also be reduced by increasing the soft bake. | ||