Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions
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'''Tool description'''<br> | '''Tool description'''<br> | ||
The Developer: TMAH manual 02 is a semi-automatic and programmable single substrate developer system, which can be used for development of resists on chips, 50 mm, 100 mm and 150 mm substrates. The development is done using AZ 726 MIF, which is a 2.38% TMAH solution with wetting agent. | The Developer: TMAH manual 02 is a semi-automatic and programmable single substrate developer system, which can be used for development of resists on chips, 50 mm, 100 mm and 150 mm substrates. The development is done using AZ 726 MIF, which is a 2.38% TMAH solution with wetting agent. | ||
Single substrates are loaded manually into the tool, but the developer dispense, puddle time, agitation, rinse and drying is controlled by the tool. | |||
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| style="padding-left: 10px" | Cleanroom E-4 | | style="padding-left: 10px" | Cleanroom E-4 | ||
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'''User manual'''<br> | '''User manual'''<br> | ||
The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login''' | The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login''' | ||
'''Tool training'''<br> | '''Tool training'''<br> | ||