Jump to content

Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
No edit summary
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
No edit summary
Line 88: Line 88:
#Dry substrate and chamber with nitrogen
#Dry substrate and chamber with nitrogen


'''User manual'''<br>
 
'''Multi puddle'''<br>
Multipuddle recipes repeat steps 2-4 for the given number of puddles.
Multipuddle recipes repeat steps 2-4 for the given number of puddles.


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Development/manualTMAH_developer"