Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions
| Line 54: | Line 54: | ||
! scope=row style="text-align: left;" | Non-uniformity | ! scope=row style="text-align: left;" | Non-uniformity | ||
| 21% || 11% | | 21% || 11% | ||
|- | |||
! scope=row style="text-align: left;" | Agitation | |||
| None || 15 cycles per minute, 20 rpm, 500 rpm/s | |||
|- | |- | ||
! scope=row style="text-align: left;" | Substrate | ! scope=row style="text-align: left;" | Substrate | ||