Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions
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! scope=row style="text-align: left;" | Substrate | ! scope=row style="text-align: left;" | Substrate | ||
| colspan="2"|SSP silicon | | colspan="2"|100 mm SSP silicon | ||
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! scope=row style="text-align: left;" | Resist | ! scope=row style="text-align: left;" | Resist | ||
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<br clear="all" /> | <br clear="all" /> | ||
<gallery style="text-align: center;" widths=450 heights=350> | |||
ManualTMAHdeveloper developRate v1.png|Development rate for under-exposed resist test | |||
ManualTMAHdeveloper uniformity v1.png|Non-uniformity for under-exposed resist test | |||
</gallery> | |||
=Equipment performance and process related parameters= | =Equipment performance and process related parameters= | ||