Specific Process Knowledge/Lithography/Development: Difference between revisions
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==Development Comparison Table== | ==Development Comparison Table== | ||
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! [[Specific Process Knowledge/Lithography/Development/beaker_developer|Manual beaker development]] | ! [[Specific Process Knowledge/Lithography/Development/beaker_developer|Manual beaker development]] | ||
! [[Specific_Process_Knowledge/Lithography/Development#Developer: SU8 (Wet Bench)|Developer: SU8 (Wet bench)]] | ! [[Specific_Process_Knowledge/Lithography/Development#Developer: SU8 (Wet Bench)|Developer: SU8 (Wet bench)]] | ||
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! [[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|Developer: TMAH UV-lithography]] | ! [[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|Developer: TMAH UV-lithography]] | ||
! [[Specific_Process_Knowledge/Lithography/Development/DUV_developer#Developer:_TMAH_Stepper|Developer: TMAH Stepper]] | ! [[Specific_Process_Knowledge/Lithography/Development/DUV_developer#Developer:_TMAH_Stepper|Developer: TMAH Stepper]] | ||
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{| class="wikitable" | |||
|- | |||
! | |||
! [[Specific Process Knowledge/Lithography/Development#Manual_beaker_development_in_fumehood|Manual beaker development]] | |||
! [[Specific_Process_Knowledge/Lithography/Development/SU8_developer|Developer: SU8 (Wet bench)]] | |||
! [[Specific_Process_Knowledge/Lithography/Development/manualEbeam_developer|Developer: E-beam 02]] | |||
! [[Specific_Process_Knowledge/Lithography/Development/manualTMAH_developer|Developer: TMAH Manual 02]] | |||
! [[Specific_Process_Knowledge/Lithography/Development/UV_developer|Developer: TMAH UV-lithography]] | |||
! [[Specific_Process_Knowledge/Lithography/Development/DUV_developer|Developer: TMAH Stepper]] | |||
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! scope=row style="text-align: left;" | Purpose | ! scope=row style="text-align: left;" | Purpose | ||