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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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In the MLA1-MLA1 tests, the design consists of ±5µm verniers with 0.1µm resolution along the X and Y axis placed in a 3 by 3 matrix covering a 60mm by 60mm area centered on the wafer. The sample is loaded, and the first layer (the linear scales) is printed. Without unloading, the second layer (the vernier scales) is printed on top of the first, and then the sample is developed.
In the MLA1-MLA1 tests, the design consists of ±5µm verniers with 0.1µm resolution along the X and Y axis placed in a 3 by 3 matrix covering a 60mm by 60mm area centered on the wafer. The sample is loaded, and the first layer (the linear scales) is printed. Without unloading, the second layer (the vernier scales) is printed on top of the first, and then the sample is developed.


{|border="1" cellspacing="0" cellpadding="3" style="text-align:center;"
|-
|-
|-style="background:silver; color:black"
!colspan="2"|MLA1-MLA1
!Mark positions
!Scaling [ppm]
!Shearing [mRad]
!Error [µm]
!Deviation [µm]
|-
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|No alignment
(stage accuracy test)
|'''X'''
|rowspan="2" align="center"| -
| -
|rowspan="2" align="center"| -
| x error
| x deviation
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| -
| y error
| y deviation
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|description
(comment)
|'''X'''
|rowspan="2" align="center"|positions
| x scaling
|rowspan="2" align="center"|shearing
| x error
| x deviation
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| y scaling
| y error
| y deviation
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|4 alignment marks
(three samples)
|'''X'''
|NA
|rowspan="2"|NA
| -0.22±0.25
| -0.19±0.19
| 1.85±2.08
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| NA
| -0.28±0.38
| -0.28±0.13
| 4.35±5.97
|}