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Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions

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Cleaning of masks using the dedicated bath in Wet bench 03.
Cleaning of masks using the dedicated bath in Wet bench 03.
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Cleaning of wafers using a beaker in a fumehood in cleanroom B1 or D3. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the Wafer or Mask Cleaning bath.
Cleaning of wafers using a beaker in a fumehood in cleanroom D3. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the Wafer or Mask Cleaning bath.
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