Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions
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!Generel description | !Generel description | ||
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*Evaporation of Ti or | *Evaporation of Ti or Ti<sub>2</sub>O<sub>3</sub> pellets in the presence of O<sub>2</sub>. | ||
*Can heat up to 250 °C | *Can heat up to 250 °C. | ||
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*Reactive DC sputtering of Ti target | *Reactive DC sputtering of Ti target | ||