Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions
Appearance
| Line 98: | Line 98: | ||
*'''1 TMPLT man disp Gyrset sprd''' | *'''1 TMPLT man disp Gyrset sprd''' | ||
Gyrset down; spread step; spin-off; deceleration; Gyrset up. | Gyrset down; spread step; spin-off; deceleration; Gyrset up. | ||
<!-- | |||
==Automatic dispense templates== | ==Automatic dispense templates== | ||
*'''1 TMPLT aut disp SU8''' | *'''1 TMPLT aut disp SU8''' | ||
| Line 112: | Line 112: | ||
*'''1 TMPLT aut disp Gyrset sprd''' | *'''1 TMPLT aut disp Gyrset sprd''' | ||
Dispense; Gyrset down; spread step; spin-off; deceleration; Gyrset up. | Dispense; Gyrset down; spread step; spin-off; deceleration; Gyrset up. | ||
--> | |||
=Processing results= | =Processing results= | ||