Specific Process Knowledge/Etch/RIE (Reactive Ion Etch): Difference between revisions
mNo edit summary |
mNo edit summary |
||
| Line 5: | Line 5: | ||
<span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned. </span> | |||
<br><br> | |||
<span style="color:#FF0000"> This information is save because it might be valuable as inspiration for other dry etch systems. | <span style="color:#FF0000"> This information is save because it might be valuable as inspiration for other dry etch systems. | ||
== Etching using the dry etch technique RIE (Reactive Ion Etch) == | == Etching using the dry etch technique RIE (Reactive Ion Etch) == | ||