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Specific Process Knowledge/Characterization: Difference between revisions

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Mmat (talk | contribs)
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|align="left"| [[Specific_Process_Knowledge/Characterization/Element_analysis|Element analysis]]||||x||||||||||||||x||x  4)||||||x  4)||||||||||||||
|align="left"| [[Specific_Process_Knowledge/Characterization/Element_analysis|Element analysis]]||||x||||||||||||||x||x  <sup>{{fn|4}}</sup>||||||x  <sup>{{fn|4}}</sup>||||||||||||||
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|align="left"| [[Specific_Process_Knowledge/Characterization/Stress_measurement|Film stress]]||||||||x||||||||||||||||||x  7)||||||||||||||
|align="left"| [[Specific_Process_Knowledge/Characterization/Stress_measurement|Film stress]]||||||||x||||||||||||||||||x  <sup>{{fn|7}}</sup>||||||||||||||
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|align="left"| Reflectivity||||||||||||x||x||||||x 6)||||||||||||||||||||x
|align="left"| Reflectivity||||||||||||x||x||||||x <sup>{{fn|6}}</sup>||||||||||||||||||||x
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|align="left"| Step coverage||x  1)||x  1)||||||||||||||||||||||||||||||||||||
|align="left"| Step coverage||x  <sup>{{fn|1}}</sup>||x  <sup>{{fn|1}}</sup>||||||||||||||||||||||||||||||||||||
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|align="left"| [[Specific_Process_Knowledge/Characterization/Measurement_of_film_thickness_and_optical_constants|Thin film thickness]]||x  1)||x  1)||x  2)||x  2)||x  ||x||x||||||x 5)||x  3)||||x||||||||||||||
|align="left"| [[Specific_Process_Knowledge/Characterization/Measurement_of_film_thickness_and_optical_constants|Thin film thickness]]||x  <sup>{{fn|1}}</sup>||x  <sup>{{fn|1}}</sup>||x  <sup>{{fn|2}}</sup>||x  <sup>{{fn|2}}</sup>||x  ||x||x||||||x <sup>{{fn|5}}</sup>||x  <sup>{{fn|3}}</sup>||||x||||||||||||||
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|align="left"| [[Specific_Process_Knowledge/Characterization/Thickness_Measurer|Wafer thickness]]||x  1)||x  1)||||||||||||x||||||||||||||||||||||||
|align="left"| [[Specific_Process_Knowledge/Characterization/Thickness_Measurer|Wafer thickness]]||x  <sup>{{fn|1}}</sup>||x  <sup>{{fn|1}}</sup>||||||||||||x||||||||||||||||||||||||
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<br clear="all">
 
<br>
 
<sup>{{fn|1}}</sup> Using the cross section method
 
<sup>{{fn|2}}</sup> Using the create step method
# Using the cross section method
<sup>{{fn|3}}</sup> With known resistivity
# Using the create step method
<sup>{{fn|4}}</sup> Composition information for crystalline materials
# With known resistivity
<sup>{{fn|5}}</sup> Only single layer
# Composition information for crystalline materials
<sup>{{fn|6}}</sup> Good for characterization of VCSEL structures and DBR mirrors
# Only single layer
<sup>{{fn|7}}</sup> Only for crystalline films
# Good for characterization of VCSEL structures and DBR mirrors
# Only for crystalline films


== Choose characterization topic ==
== Choose characterization topic ==