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| https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Tencor_P17#Tencor_P17_Stylus_Profiler | | https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Tencor_P17#Tencor_P17_Stylus_Profiler |
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| ==Optical Profiler (Sensofar S Neox) ==
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| | https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Sensofar_S_Neox |
| [[image:IMG_4555.JPG|275x275px|right|thumb|Optical Profiler (Sensofar): positioned in the clean room C-1), {{photo1}}]]
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| The Sensofar S Neox 3D Optical Profiler has a sensor head that combines confocal, interferometry and focus variation techniques as well as thick and thin film measurement capabilities.
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| The Neox sensor head provides standard microscope imaging, confocal imaging, confocal profiling, PSI (Phase Shift Interferometry), CSI (Coherence Scanning Interferometry), Active illumination (Ai) Focus Variation and high resolution thin film thickness measurements on a single instrument.
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| The main purpose is 3D topographic imaging of surfaces, step height measurements in smaller trenches/holes than can be obtained with standard stylus methods (i.e. with aspect ratios higher that 1:1), roughness measurements with larger FOV (Field Of View) than the AFM, but less horisontal resolution.
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| For most samples the optical profiler provides fast and easy information without any sample preparation. However, it can be necessary to cover thin transparent layers (< 2 µm) with a thin layer of metal.
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| The resolution is limited by the objectives and the pixel resolution.
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| [[Image:3D examples.JPG|200px|right|thumb|From the Sensofar Metrology, used with permission]]
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| '''Analysis software:'''
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| *Free analysis software for visualizing and analyzing AFM and Optical profiler files (Sensofar) [http://gwyddion.net Gwyddion]
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| *SensoView software from Sensfar want also be downloaded for all users: U:\Nlab\CleanroomDrive\_Equipment\Optical profiler Sensofar\SensoVIEW 1.6.0
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| *We have an extra license to the more advanced SensoMap software. As a user of the system you can access this by remote desktop here: DTU-8CC0321MFL. You log in using your DTU login.
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| '''The user manual, technical information (SensoSCAN and SensoVIEW manuals) and contact information can be found in LabManager (requires login):'''
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| [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=491 Optical profiler (Sensofar S Neox) info page in LabManager]
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| ===Process Information===
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| *[https://labmanager.dtu.dk/view_binary.php?fileId=5345| Sensofar presentation on how the sensofar works (for the previous system but the techniques are the same)] -requires login
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| *[https://labmanager.dtu.dk/view_binary.php?fileId=5346|S Neox leaflet including specifications] - requires login
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| *Acceptance measurements on the S Neox Sensofar: [[Media:Acceptance measurements on Nanolab samples.pdf]], measured at the acceptances test by Sensofar and Berit Herstrøm@ DTU Nanolab
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| *[[/Optical Profiler (Sensofar) acceptance test|Results from the Optical Profiler (Sensofar) acceptance test - for the previous system - expired!!]]
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| ===Equipment performance and process related parameters===
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| {| border="2" cellspacing="0" cellpadding="10"
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| !colspan="2" border="none" style="background:silver; color:black;" align="center"|<b>Equipment</b>
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| |style="background:WhiteSmoke; color:black"|<b>Optical profiler</b>
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| |-
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| !style="background:silver; color:black;" align="left"|Purpose
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| |style="background:LightGrey; color:black"|3D topographic imaging of surfaces.||style="background:WhiteSmoke; color:black"|
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| *3D imaging of surfaces
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| *Roughness measurements
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| *Step height measurements
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| *3D topographic measurements
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| *Thick and thin film thickness measurements in small spots
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| |-
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| !style="background:silver; color:black;" align="left"|Posibilities
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| |style="background:LightGrey; color:black"|Confocal, interferometric and AI focus variation tophography and reflectometry
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| *Standard microscope imaging
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| *Confocal imaging
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| *Confocal profiling
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| *PSI (Phase Shift Interferometry)
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| *CSI (Coherence Scanning Interferometry)
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| *Active illumination (Ai) Focus Variation
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| *High resolution thin film thickness measurement using reflectrometry
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| *Stitched scans
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| *Wafer mapping
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| |style="background:WhiteSmoke; color:black"|
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| [[image:Techniques overview.JPG|thumb|center|From the Sensofar S Neox 3D optical profiler brochure, used with permission]]
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| !style="background:silver; color:black" align="left"|Performance
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| |style="background:LightGrey; color:black"|Depending on the objective chosen||style="background:WhiteSmoke; color:black"|
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| *See the performance of the different objectives here:
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| [[image:Objectives01.JPG|600px|Objectives01.JPG]]
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| !style="background:silver; color:black" align="left"|Substrates
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| |style="background:LightGrey; color:black"|Substrate size
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| |style="background:WhiteSmoke; color:black"|
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| *Substrates no bigger than 150 mm x 150mm
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| |style="background:silver; color:black"|
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| | style="background:LightGrey; color:black"|Substrate materials allowed
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| |style="background:WhiteSmoke; color:black"|
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| *In principle all materials as long as they are allowed in the cleanroom outside fumehoods - no liquids!
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| |-
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| |}
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| ==Optical Profiler (Filmetrics)== | | ==Optical Profiler (Filmetrics)== |
