Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
Appearance
| Line 929: | Line 929: | ||
|>0.5µm | |>0.5µm | ||
|- | |- | ||
| | |Backside alignment error | ||
|>1µm | |>1µm | ||
|- | |- | ||
| Line 929: | Line 929: | ||
|>0.5µm | |>0.5µm | ||
|- | |- | ||
| | |Backside alignment error | ||
|>1µm | |>1µm | ||
|- | |- | ||