Jump to content

Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,304 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,304 edits
Line 160: Line 160:
=== End point signal===
=== End point signal===
====Barc etch====
====Barc etch====
The End point signal shows a top point after 5.5 s and I stopped the etch after 46.4 s giving ''' 41 s after the top point'''.
The End point signal shows a top point after 6.5 s and I stopped the etch after 30 s. Too short


<gallery caption="S047676 47s barc etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2">
<gallery caption="S047671 30s barc etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2">


File:20250213_06_endpoint.jpg
File:20250213_06_endpoint.jpg
Line 170: Line 170:


====Cr etch====
====Cr etch====
The End point signal shows a drop after 295 s and I stopped the etch after 465 s giving '''170 s after the drop started'''.
The End point signal shows a drop after 295 s and I stopped the etch after 7:00 min. Too short


<gallery caption="S047676 7:43 min Cr etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2">
<gallery caption="S047671 7:00 min Cr etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2">


File:20250213_08_droppoint.jpg
File:20250213_08_droppoint.jpg
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/Chromium/End_point"