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Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point: Difference between revisions

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<gallery caption="S047676 47s barc etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2">
<gallery caption="S047676 47s barc etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2">
File:data 03 screen shot 01.jpg
 
File:data 03 screen shot 02.jpg
File:20250213_06_endpoint.jpg
File:20250213_06_toppoint.jpg
 
</gallery>
</gallery>


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