Specific Process Knowledge/Lithography/Descum: Difference between revisions
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=Plasma Asher 4= | =Plasma Asher 4= | ||
== | ==Descum processing in plasma asher 4 & 5== | ||
[[File:PA_descum_single_v1.png|400px|thumb|Ashing amount and ashing rate when processing a single 100 mm wafer.|right]] | [[File:PA_descum_single_v1.png|400px|thumb|Ashing amount and ashing rate when processing a single 100 mm wafer.|right]] | ||