Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=544 LabManager] - '''requires login''' | Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=544 LabManager] - '''requires login''' | ||
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===Exposure dose and defocus=== | ===Exposure dose and defocus=== | ||
[[Specific Process Knowledge/Lithography/Resist#Aligner:_Maskless_04|Information on UV exposure dose]] | [[Specific Process Knowledge/Lithography/Resist#Aligner:_Maskless_04|Information on UV exposure dose]] | ||
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===[[Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing|Process information]]=== | ===[[Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing|Process information]]=== | ||