Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point: Difference between revisions
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=== End point signal=== | === End point signal=== | ||
====Barc etch==== | ====Barc etch==== | ||
The End point signal shows a | The End point signal shows a top point after 5.5 s and I stopped the etch after 46.4 s giving ''' 41 s after the top point'''. | ||
<gallery caption="S047676 47s barc etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2"> | <gallery caption="S047676 47s barc etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2"> | ||