Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point: Difference between revisions
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==Etched too long== | ==Etched too long== | ||
{| class="wikitable" | |||
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!Middel of the wafer | |||
!Close to wafer edge | |||
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<gallery caption="S047670 30 s barc etch, 7:45 min Cr etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="1"> | |||
File:S047670edge_cr_01.jpg | |||
File:S047670edge_cr_03.jpg | |||
File:S047670edge_cr_04.jpg | |||
File:S047670edge_cr_06.jpg | |||
File:S047670edge_cr_08.jpg | |||
File:S047670edge_cr_09.jpg | |||
- | |||
</gallery> | |||
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<gallery caption="S047670 30 s barc etch, 7:45 min Cr etch, Feb-2025, wafer edge, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="1"> | |||
File:S047670midt_cr_01.jpg | |||
File:S047670midt_cr_04.jpg | |||
File:S047670midt_cr_05.jpg | |||
File:S047670midt_cr_08.jpg | |||
File:S047670midt_cr_10.jpg | |||
File:S047670midt_cr_12.jpg | |||
File:S047670midt_cr_16.jpg | |||
</gallery> | |||
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==Etched too short== | ==Etched too short== | ||