Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano141: Difference between revisions

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New page: == The nano1.41 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe nano1.41''' |- ! rowspan="6" align="center"| Recipe | Gas | C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<su...
 
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<gallery caption="The results of the nano1.4 recipe" widths="250" heights="200" perrow="3">
<gallery caption="The results of the nano1.41 recipe" widths="250" heights="200" perrow="3">
image:WF_2E07b_mar23_2011-030.jpg|The 30 nm trenches
image:WF_2E07b_mar23_2011-030.jpg|The 30 nm trenches
image:WF_2E07b_mar23_2011-060.jpg|The 60 nm trenches
image:WF_2E07b_mar23_2011-060.jpg|The 60 nm trenches

Revision as of 09:07, 2 May 2011

The nano1.41 recipe

Recipe nano1.41
Recipe Gas C4F8 75 sccm, SF6 38 sccm
Pressure 4 mTorr, Strike 3 secs @ 15 mTorr
Power 800 W CP, 75 W PP
Temperature -20 degs
Hardware 100 mm Spacers
Time 120 secs
Conditions Run ID 2001
Conditioning Sequence: Oxygen clean, MU tests, processes, no oxygen between runs
Mask nm zep etched down to 6dgh4 nm