Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS: Difference between revisions
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|style="background:LightGrey; color:black"|Gas flows | |style="background:LightGrey; color:black"|Gas flows | ||
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*TEOS (tetraethoxysilane): ~50 sccm. <i>The exact flow is not know - the setpoint is much lower than 50 sccm, | *TEOS (tetraethoxysilane): ~50 sccm. <i>The exact flow is not know - the setpoint is much lower than 50 sccm, because the MFC is not calibrated for TEOS</i> | ||
*O<sub>2</sub>: 0 sccm | *O<sub>2</sub>: 0 sccm | ||
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