Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS: Difference between revisions
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'''[https://labmanager.dtu.dk/d4Show.php?id=1926 Furnace computer manual]''' | '''[https://labmanager.dtu.dk/d4Show.php?id=1926 Furnace computer manual]''' | ||
<i>No quality control is done for the LPCVD TEOS oxide furnace</i> | |||
== Manual for the furnace computer to the A, B, C and E stack furnaces == | == Manual for the furnace computer to the A, B, C and E stack furnaces == | ||