Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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==Aligner: MA6 - 2== | ==Aligner: MA6-2== | ||
[[Image:AlignerMA6-2 in E-4.jpg|300x300px|thumb|The Aligner: MA6 - 2 is placed in E-4]] | [[Image:AlignerMA6-2 in E-4.jpg|300x300px|thumb|The Aligner: MA6-2 is placed in E-4]] | ||
The Süss MicroTek Mask Aligner MA6 is designed for high resolution photolithography. | The Süss MicroTek Mask Aligner MA6 is designed for high resolution photolithography. | ||