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Specific Process Knowledge/Lithography/LiftOff: Difference between revisions

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==Poor metal adhesion/ Metal delaminating after lift-off==
==Poor metal (TiPt) adhesion/ Metal delaminating after lift-off==


''This experiment was done by Gustav E. Skands(ges@sbtinstruments.com) in May 2024''  
''This experiment was done by Gustav E. Skands(ges@sbtinstruments.com) in May 2024''  
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Process temperature considerations
Process temperature considerations
The process incorporated a deposition temperature of 50°C, which was maintained without further comparative analysis against room temperature deposition due to the successful outcomes achieved and considerations of operational cost efficiency.
The process incorporated a deposition temperature of 50°C, which was maintained without further comparative analysis against room temperature deposition due to the successful outcomes achieved and considerations of operational cost efficiency.
==Poor metal (TiAu) adhesion/ Metal delaminating after lift-off==
''This experiment was done by Mathias Zambach (zambach@fysik.dtu.dk) in June 2024''