Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/processA: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Line 232: Line 232:
|-
|-
|Etch rate in Si
|Etch rate in Si
|17 - 19 µm/min
|16 - 18.8 µm/min
|-
|-
|Non-uniformity
|Non-uniformity
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/processA"