Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples: Difference between revisions
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=Single spot EBL on JEOL 9500= | =Single spot EBL on JEOL 9500= | ||
Arrays of circular holes can be created by normal area writing of a mask of circular structures. It can however also be done with a single spot approach, where the beam will dwell at each spot for several | Arrays of circular holes can be created by normal area writing of a mask of circular structures. It can however also be done with a single spot approach, where the beam will dwell at each spot for several 100 ns and hence each spot will become a circular structure by local over exposure. You can read more about this method in the linked article. | ||
''' [http://www.sciencedirect.com/science/article/pii/S0167931714000987 Single-spot e-beam lithography for defining large arrays of nano-holes]''' | ''' [http://www.sciencedirect.com/science/article/pii/S0167931714000987 Single-spot e-beam lithography for defining large arrays of nano-holes]''' | ||