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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
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{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
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| [[image:thope240214_lines_100_06.png|1200px]]
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| [[image:thope240214_lines_50_11.png|1200px]]
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| [[image:thope240214_lines_20_13.png|1200px]]
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| colspan="1" style="text-align:center;|
Cross section SEM images of 500 nm AR-P 6200.09 exposed at 200-600 µC/cm<sup>2</sup>. Top image is 100 nm lines, center image is 50 nm lines, bottom image is 20 nm lines. Au coated for SEM imaging.
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{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
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| [[image:thope240214_lines180_100_29.png|1200px]]
| [[image:thope240214_lines250_100.png|1200px]]
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| [[image:thope240214_lines180_50_31.png|1200px]]
| [[image:thope240214_lines250_50.png|1200px]]
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| [[image:thope240214_lines180_20_33.png|1200px]]
| [[image:thope240214_lines250_20.png|1200px]]
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|-  
| colspan="1" style="text-align:center;|
| colspan="1" style="text-align:center;|
Cross section SEM images of 180 nm AR-P 6200.09 exposed at 200-600 µC/cm<sup>2</sup>. Top image is 100 nm lines, center image is 50 nm lines, bottom image is 20 nm lines. Au coated for SEM imaging.
Cross section SEM images of 250 nm AR-P 6200.09 exposed at 200-600 µC/cm<sup>2</sup>. Top image is 100 nm lines, center image is 50 nm lines, bottom image is 20 nm lines. Au coated for SEM imaging.
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