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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of SiO2 in E-Beam Evaporator Temescal-2: Difference between revisions

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==Uniformity across 150 mm wafer==
==Uniformity across 150 mm wafer==


Results have been obtained for <100> 150 mm Si wafers with native oxide, based on ellipsometry study.
Results have been obtained for <100> 150 mm Si wafers with native oxide, based on [[Specific_Process_Knowledge/Characterization/Optical_characterization#Ellipsometer|ellipsometry study]].


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