Specific Process Knowledge/Characterization/Stress measurement: Difference between revisions
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If your thin film is crystalline, you can also measure stress using [[#Stress measurement using XRD|XRD]]. | If your thin film is crystalline, you can also measure stress using [[#Stress measurement using XRD|XRD]]. | ||
==Types of stress == | ==Types of stress and their origin == | ||
A thin film can exhibit either compressive or tensile stress as illustrated by Figure 1: | A thin film can exhibit either compressive or tensile stress as illustrated by Figure 1: | ||
[[File:berit-film-stress-illustration-cropped.png|upright=3|alt=A rectangle illustrates a substrate without stress. A downward curving section of a sphere with a red band on top illustrates a substrate with compressive stress due to a thinfilm. An upward curving section of a sphere with a green band on top illustrates a substrate with tensile stress.|right|thumb|Figure 1: Compressive and tensile stress (figure by Berit Herstrøm).]] | [[File:berit-film-stress-illustration-cropped.png|upright=3|alt=A rectangle illustrates a substrate without stress. A downward curving section of a sphere with a red band on top illustrates a substrate with compressive stress due to a thinfilm. An upward curving section of a sphere with a green band on top illustrates a substrate with tensile stress.|right|thumb|Figure 1: Compressive and tensile stress (figure by Berit Herstrøm).]] | ||
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Examples of thin films that exhibit tensile stress include Cr and Ni (evaporated or sputtered) as well as SiO2 made by LPCVD TEOS. SiN made by PECVD can exhibit either tensile or compressive stress. The same is true for sputtered Si. | Examples of thin films that exhibit tensile stress include Cr and Ni (evaporated or sputtered) as well as SiO2 made by LPCVD TEOS. SiN made by PECVD can exhibit either tensile or compressive stress. The same is true for sputtered Si. | ||
*Here you can find some information about [[Specific Process Knowledge/Thin film deposition/Lesker/Stress dependence on sputter parameters in the Lesker sputter system|stress in sputtered films]] made at Nanolab | *Here you can read more general information about [[Specific Process Knowledge/Characterization/Stress measurement/Stress origins|stress in thin films]]. | ||
*Here you can find some information about [[Specific Process Knowledge/Thin film deposition/Lesker/Stress dependence on sputter parameters in the Lesker sputter system|stress in sputtered films]] made at Nanolab. | |||
*Here you can find information about [[Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Stress Wordentec Ni films|tensile stress in e-beam evaporated Ni films]]. | *Here you can find information about [[Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Stress Wordentec Ni films|tensile stress in e-beam evaporated Ni films]]. | ||