Specific Process Knowledge/Lithography/Mix-and-match: Difference between revisions
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The two different methods for pattern alignment. | The two different methods for pattern alignment. | ||
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==Alignment accuracy== | |||
Alignment accuracy is governed by the precision with which one can determine the center of the faint exposed marks and the inherent alignment accuracy of the MLA system. Typical accuracy is found to be +/- 250 nm in both x and y. | |||
=Mix-and-match resists= | =Mix-and-match resists= | ||