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Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace: Difference between revisions

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[[Image:C4helstak.jpg |thumb|300x300px|Aluminium Anneal furnace (C4). Positioned in cleanroom B-1/ Photo: DTU Nanolab internal]]
[[Image:C4helstak.jpg |thumb|300x300px|Aluminium Anneal furnace (C4). Positioned in cleanroom B-1/ Photo: DTU Nanolab internal]]


The Aluminium Anneal furnace (C4) is a Tempress horizontal furnace for annealing and oxidation of e.g. silicon wafers with aluminium or ALD oxides Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub>.
The Aluminium Anneal or Al-Anneal furnace (C4) is a Tempress horizontal furnace for annealing and oxidation of different samples.  


This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom B-1. In this furnace allowed to process wafers that contain aluminium. Please check the cross contamination information in LabManager, before you use the furnace.  
The samples can for instance be silicon and quartz wafers or small samples with aluminium or ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub>. Other materials might be allowed in the furnace, but this requires a permision from the Thin Film group. Also please check the cross contamination information in LabManager, before you use the furnace.
 
The furnace is the lowest of the C-stack furnaces positioned in cleanroom B-1. .  


'''The user manual, technical information and contact information can be found in LabManager:'''
'''The user manual, technical information and contact information can be found in LabManager:'''
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