Specific Process Knowledge/Lithography/Mix-and-match: Difference between revisions
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Content and illustration by Thomas Pedersen, DTU Nanolab unless otherwise noted. | |||
Mix-and-match lithography is a process in which two lithography processes are combined to produce a pattern in a single resist layer. In this way one can for instance combine the high resolution of E-beam lithography with the high speed of UV lithography. Other combinations using DUV are also possible. | Mix-and-match lithography is a process in which two lithography processes are combined to produce a pattern in a single resist layer. In this way one can for instance combine the high resolution of E-beam lithography with the high speed of UV lithography. Other combinations using DUV are also possible. | ||
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The two different methods for pattern alignment | The two different methods for pattern alignment. | ||
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250 nm nLOF2020 contrast curve from exposure at 100 kV on JEOL 9500 | 250 nm nLOF2020 contrast curve from exposure at 100 kV on JEOL 9500. | ||
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100 nm lines in 1500 nm thick nLOF2020 | 100 nm lines in 1500 nm thick nLOF2020. | ||
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