Specific Process Knowledge/Lithography/Development: Difference between revisions

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Revision as of 10:47, 10 November 2023 view source Elkh (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 343 edits →Developer: SU8 (Wet Bench) ← Older edit		Revision as of 12:08, 10 November 2023 view source Elkh (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 343 edits →Developer: SU8 (Wet Bench) Newer edit →
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	[[Image:~~SU-8developer~~.jpg\|300x300px\|right\|thumb\|The Developer: SU8(Wet Bench)is located in E-4 room.]]		[[Image:Developr SU8(wet bench).jpg\|300x300px\|right\|thumb\|The Developer: SU8(Wet Bench)is located in E-4 room.]]

	The SU8-Developer bench is a manually operated wet bench for submersion development of SU-8 photoresist in PGMEA (supplied in the cleanroom as mr-Dev 600). The development process is in two stages; one bath (FIRST) to dissolve the bulk of the resist, and a second, cleaner bath (FINAL) to finish the development. The development time is controlled manually by the user. After development, the substrates are rinsed with IPA in dedicated IPA bath and put for drying in the empty bath.		The SU8-Developer bench is a manually operated wet bench for submersion development of SU-8 photoresist in PGMEA (supplied in the cleanroom as mr-Dev 600). The development process is in two stages; one bath (FIRST) to dissolve the bulk of the resist, and a second, cleaner bath (FINAL) to finish the development. The development time is controlled manually by the user. After development, the substrates are rinsed with IPA in dedicated IPA bath and put for drying in the empty bath.