Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
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The samples are placed above the round metal plate in the bottom of the chamber, i.e. below the halogen lamps. The substrates are meant to be placed on top of three quartz pins. Depending on the type and size of the substrate, there are three types of quartz pins available (for the SiC-coated graphite susceptor, a 100 mm wafer and for a 150 mm wafer). Nonetheless, the susceptor should always be used, when possible (except for 8" wafers). | The samples are placed above the round metal plate in the bottom of the chamber, i.e. below the halogen lamps. The substrates are meant to be placed on top of three quartz pins. Depending on the type and size of the substrate, there are three types of quartz pins available (for the SiC-coated graphite susceptor, a 100 mm wafer and for a 150 mm wafer). Nonetheless, the susceptor should always be used, when possible (except for 8" wafers). | ||
[[Image: Platen with captions.jpg|400px|thumb|RTP2 Jipelec chamber platen. Photo: InêsDiogo@DTU Nanolab, July 2023]] | |||
[[Image:susceptor Jipelec.jpg|400px|thumb|SiC-coated graphite susceptor used in the RTP2 Jipelec. Photo: InêsDiogo@DTU Nanolab, July 2023]] | [[Image:susceptor Jipelec.jpg|400px|thumb|SiC-coated graphite susceptor used in the RTP2 Jipelec. Photo: InêsDiogo@DTU Nanolab, July 2023]] | ||