Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
| Line 21: | Line 21: | ||
The machine consists of a reactor chamber, in which different samples can be processed/annealed at temperatures up to 1200 °C. | The machine consists of a reactor chamber, in which different samples can be processed/annealed at temperatures up to 1200 °C. | ||
The chamber can be heated up very rapidly by the use of 18 infrared halogen lamps that are situated in the chamber lid. A quartz plate is placed below the lamps, i.e. between the lamps and the sample(s). Below the platen, there is an optical pyrometer aligned with the center of the substrate, that is placed on the bottom part of the chamber. The platen presents additional inlets where multiple thermocouples can be mounted. These details are exemplified in images | The chamber can be heated up very rapidly by the use of 18 infrared halogen lamps that are situated in the chamber lid. A quartz plate is placed below the lamps, i.e. between the lamps and the sample(s). Below the platen, there is an optical pyrometer aligned with the center of the substrate, that is placed on the bottom part of the chamber. The platen presents additional inlets where multiple thermocouples can be mounted. These details are exemplified in the images on the right. | ||
[[Image:RTP reactor schematic.jpg|400px|thumb|RTP2 Jipelec reactor schematic]] | [[Image:RTP reactor schematic.jpg|400px|thumb|RTP2 Jipelec reactor schematic]] | ||