Specific Process Knowledge/Lithography/Mix-and-match: Difference between revisions

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 {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
 |-
-| [[image:250nmnLOF.png|800px]]
+| [[image:IMAGE74_540.png|300px]] || [[image:IMAGE825_540.png|300px]] || [[image:IMAGE768_540.png|300px]] || [[image:IMAGE847_540.png|300px]]
 |-
-| colspan="1" style="text-align: center;|
+| colspan="4" style="text-align: center;|
-Contrast curve for 250 nm nLOF2020 exposed at 100 kV on JEOL 9500. Image: Thomas Pedersen.
+Example images from left to right: 100 nm lines (4 µm FOV), 150 nm lines (4 µm FOV), 100 nm vernier scale lines (25 µm FOV), cartoon figures (25 µm FOV). Image: Thomas Pedersen.
 |}