Specific Process Knowledge/Lithography/Mix-and-match: Difference between revisions
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Mix-and-match lithography is a process in which two lithography processes are combined to produce a pattern in a single resist layer. In this way one can combine the high resolution of E-beam lithography with the high speed of UV lithography. | Mix-and-match lithography is a process in which two lithography processes are combined to produce a pattern in a single resist layer. In this way one can combine the high resolution of E-beam lithography with the high speed of UV lithography. | ||
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The two different methods for pattern alignment. Image: Thomas Pedersen. | |||
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Revision as of 09:36, 9 October 2023
Mix-and-match lithography is a process in which two lithography processes are combined to produce a pattern in a single resist layer. In this way one can combine the high resolution of E-beam lithography with the high speed of UV lithography.
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The two different methods for pattern alignment. Image: Thomas Pedersen. |