Specific Process Knowledge/Etch/Wet Aluminium Etch: Difference between revisions
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[[Category: Etch (Wet) bath|Aluminium]] | [[Category: Etch (Wet) bath|Aluminium]] | ||
Wet etching of aluminium can be done using many different acids and bases. Using dilute phosphoric acid gives reasonably good control and compatibility with photoresists. Etching with dilute phosphoric acid is suitable for etching pure aluminium. If the aluminium is alloyed with other metals, other etchants may be better suited. Previously, aluminium with 1,5% silicon was used at DTU Nanolab. This alloy is no longer in use at DTU Nanolab but a suitable etchant ( | Wet etching of aluminium can be done using many different acids and bases. Using dilute phosphoric acid gives reasonably good control and compatibility with photoresists. Etching with dilute phosphoric acid is suitable for etching pure aluminium. If the aluminium is alloyed with other metals, other etchants may be better suited. Previously, aluminium with 1,5% silicon was used at DTU Nanolab. This alloy is no longer in use at DTU Nanolab but a suitable etchant (Aluminum etch 80-15-3-2) for this alloy is included below. | ||
=Wet Aluminium Etch= | =Wet Aluminium Etch= | ||