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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
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! width="350" |  
! width="350" |  


|+'''Design case: Five 100 µm wide, 40 mm long lines, spaced 10 mm apart (40x40 mm<sup>2</sup>)'''
|+'''Design case: Five 100 µm wide, 40 mm long lines, spaced 10 mm apart (40x40 mm<sup>2</sup>). Data and graphics by Thomas Anhøj @ DTU Nanolab, 2019-2023.'''
|- border="0" align="center"
|- border="0" align="center"
|[[Image:MLA150_LongLinesEW.JPG|300px]]
|[[Image:MLA150_LongLinesEW.JPG|300px]]
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