Specific Process Knowledge/Back-end processing/Micro transfer printer: Difference between revisions

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[[Category: Equipment|Backend]]
[[Category: Equipment|Backend]]
[[Category: Back-end_processing]]
[[Category: Backend]]


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Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=464 LabManager] - '''requires login'''
Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=503 LabManager] - '''requires login'''


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Revision as of 10:46, 31 August 2023

The contents on this page, including all images and pictures, was created by DTU Nanolab staff unless otherwise stated.

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Equipment info in LabManager - requires login

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Equipment performance and process related parameters

Purpose

UV exposure

Performance Exposure mode
  • Flood exposure
  • Proximity exposure with mask possible for 4inch substrate
  • Inclined exposure
  • Rotating exposure
Exposure light/filters
  • Near UV(350-450nm)
  • Mid UV (260-320nm)
  • Deep UV(220-260nm)
Minimum structure size
Mask size

5x5inch optinal

Alignment modes

No alignment possible

Substrates Substrate size

Up to 8inch substrates, different shapes

Allowed materials

All cleanroom materials

Batch

1