Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142: Difference between revisions
No edit summary |
No edit summary |
||
| Line 80: | Line 80: | ||
| | | | ||
|} | |} | ||
===Etching SRN (Silicon Rich Nitride) with nano1.42=== | |||
No edit summary |
Bghe (talk | contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,318 edits No edit summary |
||
| Line 80: | Line 80: | ||
| | | | ||
|} | |} | ||
===Etching SRN (Silicon Rich Nitride) with nano1.42=== | |||